- Introduction
Online
₹ 700 3,499
Quick facts
particular | details | |
---|---|---|
Medium of instructions
English
|
Mode of learning
Self study
|
Mode of Delivery
Video and Text Based
|
Course and certificate fees
Fees information
certificate availability
certificate providing authority
The syllabus
Introduction
Inception of Layout- CMOS Fabrication Process
- Create active regions
- Formation of N-well and P-well
- Formation of gate terminal
- Lightly doped drain (LDD) formation
- Source drain formation
- Local interconnect formation
- Higher level metal formation
Introduction to 'Corner stitching' and 'Tech files'
- INV.mag
- min2.tech
- Corner stitching introduction
- Corner stitch to planes to tiles
- Active tile types and tech file content
- Contacts and styles
- Connect section for circuit extraction
Design Rule Checking (DRC)
- Introduction to DRC and lambda design rules
- Poly extension and poly to diffusion Spacing Rules
- Poly to diffusion spacing and diffusion contact width rules
- Metal1 width and poly to metal1 spacing rules
- Contact spacing and minimum active width rules
- From logic to layout to SPICE
Introduction to Euler's Path and stick diagram
- Introduction to simple path, euler's path and euler's circuit
- Introduction to stick diagram
- Derive actual dimension from stick diagram
Art of Layout using Euler's Path and stick diagram
- Pre-layout simulation
- Layout using 'only' stick diagram
- Euler's Path for Fn- Input gate ordering
- Improved stick diagram for new gate input ordering
- Abstract layout from stick diagram
- Derive actual dimension for Fn
- Script to create layout
- draw_fn.tcl
- Final Layout and Input/Output Labelling
Conclusion, Acknowledgements and What next!!!
- fn.prelayout.cir
- fn.postlayout.mag
- Post-layout simulation and conclusion
Instructors
Mr Kunal Ghosh
Director, instructors
Freelancer
M.E /M.Tech.