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Basic Overview of Semiconductor Device Processing and IC Fabrication
Online
12 Weeks
Free Quick Facts
| Medium Of Instructions | Mode Of Learning | Mode Of Delivery |
|---|---|---|
| English | Self Study |
Courses and Certificate Fees
| Fees Informations | Certificate Availability | Certificate Providing Authority |
|---|---|---|
| INR 1000 | yes | IIT Kanpur |
The Syllabus
- General Overview - history, integration and scaling trends in VLSI.
- Enablers of VLSI technology – planar technology, basic characterisation, cleanroom; IC Device Process Integration – doping, patterning process; Planar processing of P-N junction diode.
- IC Device Process Integration – CMOS planar processing; Evolution of FET structure and newer device structures.
- IC packaging; Support technology - Vacuum systems.
- Support technology - Plasma for processing; Crystalline substrates.
- Substrates – silicon wafers; silicon-on-insulator (SOI); GaAs and alternate substrates.
- Unit Additive Processes – Oxidation and nitridation of silicon.
- Unit Additive Processes – Diffusion.
- Unit Additive Processes – Ion implantation.
- Unit Additive Processes – Thin film process; Introduction to chemical vapour deposition (CVD).
- Unit Additive Processes – More on CVD process; physical vapour deposition (PVD).
- Unit Patterning Process - photolithography; Unit Subtractive Processes – Etching (cleaning, wet and dry); Statistical Tools - statistical process control (SPC) and design of experiment (DOE); Conclusion Lecture. Supplementary lecture on printing process for thin films.
Instructors
Articles
19 Sep'25, 07:01 AM
4 Mar'24, 07:09 AM
19 Sep'25, 07:01 AM
4 Mar'24, 07:09 AM